2018 Residency applications now open
PhotoAccess invites artists at all career stages to apply for their In Focus and Dark Matter residencies.
When: Applications close Midnight Sunday 18 March 2018
PhotoAccess invites artists at all career stages to apply for their In Focus and Dark Matter residencies, giving two artists the opportunity to develop and showcase contemporary photo-based art in a supportive and stimulating artistic environment.
Each residency will be offered from March to November 2018 and culminate in a solo exhibition in the PhotoAccess Huw Davies Gallery in November 2018.
For full details and to submit your online application, visit the PhotoAccess website.
Image: Casey Crockford, Andy Mullens, Mikaila Jurkewicz with Head of Photomedia, ANU School of Art, Martyn Jolly.